Precursor Vapor Delivery Systems

VaporStation®

Silicon wafer

VaporStation® is an advanced, fully automated vapor delivery system engineered to deliver superior vapor concentration at dynamic flow rates. Designed for both end-users and process tool manufacturers, it offers centralized optimization to reduce total cost of ownership while ensuring exceptional reliability.

By eliminating the need for on-tool bubblers and resident chemicals at the point of use, the VaporStation® enhances safety and drives efficiencies.

Why choose VaporStation®?

  • Safe & centralized precursor delivery
  • Lowest total cost of ownership
  • Stable vapor concentration at dynamic flow rates
  • Highest availability through redundancy solutions
  • VaporStation® is SEMI compliant.
Ceres C06-51791-TMGA

Applications

VaporStation® is an enhanced solution for semiconductor fabs, offering precise and efficient bulk vapor delivery to multiple point of use. Designed to meet the rigorous demands of semiconductor manufacturing, this system ensures consistent and accurate vapor concentration, supporting various processes such as CVD, ALD or EPI.

Features

  • Real-time monitoring of concentration and flow

  • Fully automated operation

  • State-of-the-art PLC
  • Bubbler temperature control

  • User-friendly interface
Download Brochure

Download Brochure

VaporStation Vapor Delivery System Datasheet Including Overview, Key Features, and Applications
Filename
Ceres-VaporStation-Vapor Delivery System.pdf
Size
959 KB
Format
pdf
Download Brochure

Contact our experts

Reach out to our expert teams today to discover how VaporStation® can revolutionize your vapor delivery processes.