VaporJet™ is a proprietary vaporizer that atomizes the injected liquid/gas mixture and instantly evaporates the micro-droplets to produce a precise vapor concentration and mass flow rate of vapor to CVD processes. Direct Liquid Injection (DLI) of controlled amounts of a liquid and gas into the VaporJet™ produce the target ratio and flow rate of the vapor. The resulting vapor mixture is delivered directly to the reactor chamber. VaporJet™ is available in two sizes, with volume for phase change and thermal energy, and high vapor flow rate capacity to support a wide ranges of CVD processes. VaporJet™ features a proprietary atomizer at the inlet to produce micro droplets for instant phase change from liquid to vapor, using hot gas rather than hot surface to achieve vaporization.
Why choose VaporJet™?
- Vapor on demand with gentle vaporization
- Supports high temperature, pressure, and flow rate
- Simple, reliable, flexible, and serviceable.
- Supports most semiconductor liquid precursors
Applications
• CVD process tools with POU DLI vapor delivery on board
• High temperature and high flow rate vaporization, such as TEOS
• Supports single points of use, due to premixed liquid and carrier gas.
Features
- 3ˮ diameter proprietary heat exchanger and micro droplet atomizer
- 5ˮ and 8ˮ models, with configurable port sizes and power input
- Vapor flow control by upstream LFC and MFC mixing and injection
- Fine droplet atomizer increases liquid surface area for rapid evaporation
- Hot gas provides the energy to evaporate the fine droplets
- Wet bulb depression of the droplet ensures evaporation without decomposition
- Evaporative lifetime of a droplet is roughly 12 microseconds
- No liquid carryover into the process.
Download Brochure
- Filename
- Ceres-VaporJet-DLI Vaporizer.pdf
- Size
- 891 KB
- Format
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